R. D. Long, É. O’Connor, S. Monaghan, K. Cherkaoui, K. K. Thomas, F. Chalvet, I. M. Povey, M. E. Pemble, and P. K. Hurley.P. Casey and G. Hughes S. B. Newcomb.N. Goel, W. Tsai.
Structural Analysis, Elemental Profiling, and Electrical Characterisation of HfO2 Thin Films Deposited on In0.53Ga0.47As Surfaces by Atomic Layer Deposition.