Long, RD;O'Connor, E;Newcomb, SB;Monaghan, S;Cherkaoui, K;Casey, P;Hughes, G;Thomas, KK;Chalvet, F;Povey, IM;Pemble, ME;Hurley, PK
Structural analysis, elemental profiling, and electrical characterization of HfO2 thin films deposited on In0.53Ga0.47As surfaces by atomic layer deposition