Peer-Reviewed Journal Details
Mandatory Fields
Rajani K.;Daniels S.;McNally P.;Lucas F.;Alam M.
2010
July
Physica Status Solidi (A) Applications and Materials
Ultrathin chromium transparent metal contacts by pulsed dc magnetron sputtering
Published
()
Optional Fields
Contacts Cr Electrical properties Morphology Optical transmittance Sputtering
207
7
1586
1589
Optoelectronic technology frequently demands optically transparent materials. In this paper we present an overview of the development of ultrathin chromium films of above 80% optical transparency and 10 2-10 3mωcm resistivity using bipolar pulsed dc magnetron sputtering. The surface morphology and film resistivity are investigated using atomic force microscopy (AFM) and four point probe, respectively. The variation of the electrical properties of the film with thickness, pulse duty cycle and target power are examined. An optimal experimental condition is suggested for developing transparent metal contacts, which can be used for the realisation of optoelectronic devices including organic light-emitting diodes on flexible, low cost polymeric substrates. This process does not require high temperature and post-deposition annealing unlike other transparent conducting oxides.
1862-6300
10.1002/pssa.200983732
Grant Details